NEMO-CE

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Sensors
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Action: 0 of 37 selected

Name	5 category	operation mode	ID
Hotplate 2	Lithography	Regular	21
Hotplate 1	Lithography	Regular	20
HMDS Prime	Lithography	Regular	19
SussMA8	Lithography	Regular	18
SussMA6	Lithography	Regular	17
ASML Stepper	Lithography	Regular	16
JEOL E-beam	Lithography	Regular	15
Gemini 500 FESEM	Imaging and Analysis	Regular	137
Glow Discharge	Imaging and Analysis	Regular	98
Leica EM GP	Imaging and Analysis	Regular	69
NanoMill	Imaging and Analysis	Regular	57
Bruker AFM	Imaging and Analysis	Regular	53
Asylum AFM	Imaging and Analysis	Regular	50
Veeco AFM	Imaging and Analysis	Regular	12
ZEISS FESEM	Imaging and Analysis	Regular	10
B102 Furnace RCA Clean	Furnaces	Regular	114
LHL Tube 3 Nitride	Furnaces	Regular	96
LHL Tube 2 Anneal	Furnaces	Regular	95
LHL Tube 1 Oxide	Furnaces	Regular	94
RHL Tube 4 Poly	Furnaces	Regular	93
RHL Tube 3 Nitride	Furnaces	Regular	92
RHL Tube 2 Anneal	Furnaces	Regular	91
RHL Tube 1 Oxide	Furnaces	Regular	90
AnnealSys RTA	Furnaces	Regular	78
Oxford III-V Etcher	Dry Etch	Regular	136
Oxford Silicon Etcher	Dry Etch	Regular	135
Oxford Metal Etcher	Dry Etch	Regular	134
790 RIE Nitride Left	Dry Etch	Regular	131
790 RIE Right	Dry Etch	Regular	130
790 RIE Middle	Dry Etch	Regular	129
SPTS Deep Si Etch	Dry Etch	Regular	58
Ion Mill	Dry Etch	Regular	8
Microwave Asher	Dry Etch	Regular	7
XeF2 Silicon Etcher	Dry Etch	Regular	6
Atomic Layer Deposition	Chemical Vapor Deposition	Regular	4
PECVD	Chemical Vapor Deposition	Regular	2
4Wave Cluster Sputter	Physical Vapor Deposition	Regular	63

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