NEMO-CE

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Action: 0 of 37 selected

Name	2 category	operation mode	3 ID
Sputter B104 Left	Physical Vapor Deposition	Regular	32
Sputter B104 Right	Physical Vapor Deposition	Regular	33
Parylene Deposition	Physical Vapor Deposition	Regular	34
4Wave Cluster Sputter	Physical Vapor Deposition	Regular	63
Thermal Thin-Al Evaporator	Physical Vapor Deposition	Regular	99
E-Beam and Thermal Evaporator	Physical Vapor Deposition	Regular	132
E-Beam Evaporator	Physical Vapor Deposition	Regular	133
PDMS Spin Coater	Soft Lithography	Regular	70
PDMS Mixer	Soft Lithography	Regular	71
PDMS Plasma Bonder	Soft Lithography	Regular	72
PDMS Curing Oven 1	Soft Lithography	Regular	73
PDMS Puncher	Soft Lithography	Regular	74
Microfluidic Test Station	Soft Lithography	Regular	75
Silanization Oven	Soft Lithography	Regular	76
PDMS Curing Oven 2	Soft Lithography	Regular	77
Wafer Bonder	Specialty Tools	Regular	35
Critical Point Dryer 1	Specialty Tools	Regular	36
Critical Point Dryer 2	Specialty Tools	Regular	37
CMP	Specialty Tools	Regular	38
Nano Enclosure	Specialty Tools	Regular	83
Wafer Cleaner	Specialty Tools	Regular	87
B101 RCA Bench	Wet Chemistry	Regular	39
B101 Hot Phos Bench	Wet Chemistry	Regular	40
B101 KOH Bench	Wet Chemistry	Regular	41
B101 Solvent Hood	Wet Chemistry	Regular	42
B102 Acid Hood	Wet Chemistry	Regular	43
Metal Liftoff	Wet Chemistry	Regular	46
B102 Spin Rinse Dryer	Wet Chemistry	Regular	48
B101 Spin Rinse Dryer	Wet Chemistry	Regular	54
SPTS HF Vapor Etcher	Wet Chemistry	Regular	55
SSEC Piranha 1	Wet Chemistry	Regular	79
SSEC Piranha 2	Wet Chemistry	Regular	80
SSEC RCA	Wet Chemistry	Regular	81
A106 Base Hood	Wet Chemistry	Regular	118
B101 Acid Hood	Wet Chemistry	Regular	126
B102 Solvent Hood	Wet Chemistry	Regular	127
B104 Solvent Hood	Wet Chemistry	Regular	128

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