NEMO-CE

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Action: 0 of 37 selected

4 Name	3 category	operation mode	ID
Nitrogen Oven	Lithography	Regular	86
SussMA6	Lithography	Regular	17
SussMA8	Lithography	Regular	18
Suss Resist Coater	Lithography	Regular	64
Suss Resist Developer	Lithography	Regular	65
Vac Oven 1	Lithography	Regular	22
Vac Oven 2	Lithography	Regular	23
Vac Oven 3	Lithography	Regular	24
Asylum AFM	Imaging and Analysis	Regular	50
Bruker AFM	Imaging and Analysis	Regular	53
Gemini 500 FESEM	Imaging and Analysis	Regular	137
Glow Discharge	Imaging and Analysis	Regular	98
Leica EM GP	Imaging and Analysis	Regular	69
NanoMill	Imaging and Analysis	Regular	57
Veeco AFM	Imaging and Analysis	Regular	12
ZEISS FESEM	Imaging and Analysis	Regular	10
AnnealSys RTA	Furnaces	Regular	78
B102 Furnace RCA Clean	Furnaces	Regular	114
LHL Tube 1 Oxide	Furnaces	Regular	94
LHL Tube 2 Anneal	Furnaces	Regular	95
LHL Tube 3 Nitride	Furnaces	Regular	96
RHL Tube 1 Oxide	Furnaces	Regular	90
RHL Tube 2 Anneal	Furnaces	Regular	91
RHL Tube 3 Nitride	Furnaces	Regular	92
RHL Tube 4 Poly	Furnaces	Regular	93
790 RIE Middle	Dry Etch	Regular	129
790 RIE Nitride Left	Dry Etch	Regular	131
790 RIE Right	Dry Etch	Regular	130
Ion Mill	Dry Etch	Regular	8
Microwave Asher	Dry Etch	Regular	7
Oxford III-V Etcher	Dry Etch	Regular	136
Oxford Metal Etcher	Dry Etch	Regular	134
Oxford Silicon Etcher	Dry Etch	Regular	135
SPTS Deep Si Etch	Dry Etch	Regular	58
XeF2 Silicon Etcher	Dry Etch	Regular	6
Atomic Layer Deposition	Chemical Vapor Deposition	Regular	4
PECVD	Chemical Vapor Deposition	Regular	2

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