NEMO-CE

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Action: 0 of 37 selected

Name	3 category	operation mode	4 ID
Nano-imprinter	Lithography	Regular	26
ASML Design Station	Lithography	Regular	45
JEOL E-beam Cleanroom	Lithography	Regular	59
Suss Resist Coater	Lithography	Regular	64
Suss Resist Developer	Lithography	Regular	65
DUV Resist Stabilizer	Lithography	Regular	84
MLA 150	Lithography	Regular	85
Nitrogen Oven	Lithography	Regular	86
ZEISS FESEM	Imaging and Analysis	Regular	10
Veeco AFM	Imaging and Analysis	Regular	12
Asylum AFM	Imaging and Analysis	Regular	50
Bruker AFM	Imaging and Analysis	Regular	53
NanoMill	Imaging and Analysis	Regular	57
Leica EM GP	Imaging and Analysis	Regular	69
Glow Discharge	Imaging and Analysis	Regular	98
Gemini 500 FESEM	Imaging and Analysis	Regular	137
AnnealSys RTA	Furnaces	Regular	78
RHL Tube 1 Oxide	Furnaces	Regular	90
RHL Tube 2 Anneal	Furnaces	Regular	91
RHL Tube 3 Nitride	Furnaces	Regular	92
RHL Tube 4 Poly	Furnaces	Regular	93
LHL Tube 1 Oxide	Furnaces	Regular	94
LHL Tube 2 Anneal	Furnaces	Regular	95
LHL Tube 3 Nitride	Furnaces	Regular	96
B102 Furnace RCA Clean	Furnaces	Regular	114
XeF2 Silicon Etcher	Dry Etch	Regular	6
Microwave Asher	Dry Etch	Regular	7
Ion Mill	Dry Etch	Regular	8
SPTS Deep Si Etch	Dry Etch	Regular	58
790 RIE Middle	Dry Etch	Regular	129
790 RIE Right	Dry Etch	Regular	130
790 RIE Nitride Left	Dry Etch	Regular	131
Oxford Metal Etcher	Dry Etch	Regular	134
Oxford Silicon Etcher	Dry Etch	Regular	135
Oxford III-V Etcher	Dry Etch	Regular	136
PECVD	Chemical Vapor Deposition	Regular	2
Atomic Layer Deposition	Chemical Vapor Deposition	Regular	4

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