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Action: 0 of 37 selected

2 Name	category	operation mode	ID
A105 Solvent Hood	Lithography/Spin-Develop	Regular	117
A105 Nikon L200	Optical Microscopes	Regular	123
A105 Develop Hood	Lithography/Spin-Develop	Regular	116
A104 EBL Spinner Right	Lithography/Spin-Develop	Regular	110
A104 EBL Spinner Left	Lithography/Spin-Develop	Regular	109
A104 EBL Spinner Hood	Lithography/Spin-Develop	Regular	111
A104 EBL Develop Hood Right	Lithography/Spin-Develop	Regular	113
A104 EBL Develop Hood Left	Lithography/Spin-Develop	Regular	112
A103 Spinner Right	Lithography/Spin-Develop	Regular	108
A103 Spinner Hood	Lithography/Spin-Develop	Regular	105
A103 Photomask Bench	Lithography/Spin-Develop	Regular	44
A103 Nikon L200	Optical Microscopes	Regular	122
A103 Develop Hood	Lithography/Spin-Develop	Regular	106
A102 Spinner Right	Lithography/Spin-Develop	Regular	102
A102 Spinner Left	Lithography/Spin-Develop	Regular	101
A102 Spinner Hood	Lithography/Spin-Develop	Regular	103
A102 Nikon MM-800	Optical Microscopes	Regular	121
A102 Develop Hood	Lithography/Spin-Develop	Regular	104
A101 Leica MZ7	Optical Microscopes	Regular	119
A101 Busch & Lomb	Optical Microscopes	Regular	120
790 RIE Right	Dry Etch	Regular	130
790 RIE Nitride Left	Dry Etch	Regular	131
790 RIE Middle	Dry Etch	Regular	129
4Wave Cluster Sputter	Physical Vapor Deposition	Regular	63
Unaxis ICP Etcher	Dry Etch	Regular	9
Unaxis Deep Si Etcher	Dry Etch	Regular	5
TITAN TEM	Imaging and Analysis	Regular	11
SSEC Piranha 2	Wet Chemistry	Regular	80
Sinter	Gen Furnaces	Regular	1
LHL Tube 4 LTO	Furnaces	Regular	100
Flip Chip Bonder	Packaging	Regular	52
FEI FIB 2	Focused Ion Beams	Regular	14
FEI FIB 1	Focused Ion Beams	Regular	13
Dynatex GSX Scribe and Break	Packaging	Regular	89
Downstream Asher	Dry Etch	Regular	66
B102 Acid Hood	Wet Chemistry	Regular	43
A103 Spinner Left	Lithography/Spin-Develop	Regular	107

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