NEMO-CE

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Action: 0 of 37 selected

Name	2 category	operation mode	3 ID
Leica EM GP	Imaging and Analysis	Regular	69
Glow Discharge	Imaging and Analysis	Regular	98
Gemini 500 FESEM	Imaging and Analysis	Regular	137
AnnealSys RTA	Furnaces	Regular	78
RHL Tube 1 Oxide	Furnaces	Regular	90
RHL Tube 2 Anneal	Furnaces	Regular	91
RHL Tube 3 Nitride	Furnaces	Regular	92
RHL Tube 4 Poly	Furnaces	Regular	93
LHL Tube 1 Oxide	Furnaces	Regular	94
LHL Tube 2 Anneal	Furnaces	Regular	95
LHL Tube 3 Nitride	Furnaces	Regular	96
B102 Furnace RCA Clean	Furnaces	Regular	114
XeF2 Silicon Etcher	Dry Etch	Regular	6
Microwave Asher	Dry Etch	Regular	7
Ion Mill	Dry Etch	Regular	8
SPTS Deep Si Etch	Dry Etch	Regular	58
790 RIE Middle	Dry Etch	Regular	129
790 RIE Right	Dry Etch	Regular	130
790 RIE Nitride Left	Dry Etch	Regular	131
Oxford Metal Etcher	Dry Etch	Regular	134
Oxford Silicon Etcher	Dry Etch	Regular	135
Oxford III-V Etcher	Dry Etch	Regular	136
PECVD	Chemical Vapor Deposition	Regular	2
Atomic Layer Deposition	Chemical Vapor Deposition	Regular	4
B102 Acid Hood	Wet Chemistry	Regular	43
SSEC Piranha 2	Wet Chemistry	Regular	80
Flip Chip Bonder	Packaging	Regular	52
Dynatex GSX Scribe and Break	Packaging	Regular	89
A103 Spinner Left	Lithography/Spin-Develop	Regular	107
TITAN TEM	Imaging and Analysis	Regular	11
Sinter	Gen Furnaces	Regular	1
LHL Tube 4 LTO	Furnaces	Regular	100
FEI FIB 1	Focused Ion Beams	Regular	13
FEI FIB 2	Focused Ion Beams	Regular	14
Unaxis Deep Si Etcher	Dry Etch	Regular	5
Unaxis ICP Etcher	Dry Etch	Regular	9
Downstream Asher	Dry Etch	Regular	66

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