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Action: 0 of 37 selected

6 Name	5 category	4 operation mode	ID
NanoMill	Imaging and Analysis	Regular	57
Veeco AFM	Imaging and Analysis	Regular	12
ZEISS FESEM	Imaging and Analysis	Regular	10
AnnealSys RTA	Furnaces	Regular	78
B102 Furnace RCA Clean	Furnaces	Regular	114
LHL Tube 1 Oxide	Furnaces	Regular	94
LHL Tube 2 Anneal	Furnaces	Regular	95
LHL Tube 3 Nitride	Furnaces	Regular	96
RHL Tube 1 Oxide	Furnaces	Regular	90
RHL Tube 2 Anneal	Furnaces	Regular	91
RHL Tube 3 Nitride	Furnaces	Regular	92
RHL Tube 4 Poly	Furnaces	Regular	93
790 RIE Middle	Dry Etch	Regular	129
790 RIE Nitride Left	Dry Etch	Regular	131
790 RIE Right	Dry Etch	Regular	130
Ion Mill	Dry Etch	Regular	8
Microwave Asher	Dry Etch	Regular	7
Oxford III-V Etcher	Dry Etch	Regular	136
Oxford Metal Etcher	Dry Etch	Regular	134
Oxford Silicon Etcher	Dry Etch	Regular	135
SPTS Deep Si Etch	Dry Etch	Regular	58
XeF2 Silicon Etcher	Dry Etch	Regular	6
Atomic Layer Deposition	Chemical Vapor Deposition	Regular	4
4Wave Cluster Sputter	Physical Vapor Deposition	Regular	63
Sinter	Gen Furnaces	Regular	1
B102 Acid Hood	Wet Chemistry	Regular	43
SSEC Piranha 2	Wet Chemistry	Regular	80
Dynatex GSX Scribe and Break	Packaging	Regular	89
Flip Chip Bonder	Packaging	Regular	52
A103 Spinner Left	Lithography/Spin-Develop	Regular	107
TITAN TEM	Imaging and Analysis	Regular	11
LHL Tube 4 LTO	Furnaces	Regular	100
FEI FIB 1	Focused Ion Beams	Regular	13
FEI FIB 2	Focused Ion Beams	Regular	14
Downstream Asher	Dry Etch	Regular	66
Unaxis Deep Si Etcher	Dry Etch	Regular	5
Unaxis ICP Etcher	Dry Etch	Regular	9

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