NEMO-CE

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Action: 0 of 37 selected

6 Name	5 category	4 operation mode	ID
Laser Mask Writer	Lithography	Regular	25
JEOL E-beam Cleanroom	Lithography	Regular	59
JEOL E-beam	Lithography	Regular	15
Hotplate 2	Lithography	Regular	21
Hotplate 1	Lithography	Regular	20
HMDS Prime	Lithography	Regular	19
DUV Resist Stabilizer	Lithography	Regular	84
ASML Stepper	Lithography	Regular	16
ASML Design Station	Lithography	Regular	45
ZEISS FESEM	Imaging and Analysis	Regular	10
Veeco AFM	Imaging and Analysis	Regular	12
NanoMill	Imaging and Analysis	Regular	57
Leica EM GP	Imaging and Analysis	Regular	69
Glow Discharge	Imaging and Analysis	Regular	98
Gemini 500 FESEM	Imaging and Analysis	Regular	137
Bruker AFM	Imaging and Analysis	Regular	53
Asylum AFM	Imaging and Analysis	Regular	50
RHL Tube 4 Poly	Furnaces	Regular	93
RHL Tube 3 Nitride	Furnaces	Regular	92
RHL Tube 2 Anneal	Furnaces	Regular	91
RHL Tube 1 Oxide	Furnaces	Regular	90
LHL Tube 3 Nitride	Furnaces	Regular	96
LHL Tube 2 Anneal	Furnaces	Regular	95
LHL Tube 1 Oxide	Furnaces	Regular	94
B102 Furnace RCA Clean	Furnaces	Regular	114
AnnealSys RTA	Furnaces	Regular	78
XeF2 Silicon Etcher	Dry Etch	Regular	6
SPTS Deep Si Etch	Dry Etch	Regular	58
Oxford Silicon Etcher	Dry Etch	Regular	135
Oxford Metal Etcher	Dry Etch	Regular	134
Oxford III-V Etcher	Dry Etch	Regular	136
Microwave Asher	Dry Etch	Regular	7
Ion Mill	Dry Etch	Regular	8
790 RIE Right	Dry Etch	Regular	130
790 RIE Nitride Left	Dry Etch	Regular	131
790 RIE Middle	Dry Etch	Regular	129
Atomic Layer Deposition	Chemical Vapor Deposition	Regular	4

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