| B101 RCA Bench | Wet Chemistry |  |  | Regular |  |  |  |  | 39 |
| B101 KOH Bench | Wet Chemistry |  |  | Regular |  |  |  |  | 41 |
| B101 Hot Phos Bench | Wet Chemistry |  |  | Regular |  |  |  |  | 40 |
| B101 Acid Hood | Wet Chemistry |  |  | Regular |  |  |  |  | 126 |
| Atomic Layer Deposition | Chemical Vapor Deposition |  |  | Regular |  |  |  |  | 4 |
| Asylum AFM | Imaging and Analysis |  |  | Regular |  |  |  |  | 50 |
| AnnealSys RTA | Furnaces |  |  | Regular |  |  |  |  | 78 |
| Aluminum Wire Bonder | Packaging |  |  | Regular |  |  |  |  | 51 |
| ASML Stepper | Lithography |  |  | Regular |  |  |  |  | 16 |
| ASML Design Station | Lithography |  |  | Regular |  |  |  |  | 45 |
| A106 Base Hood | Wet Chemistry |  |  | Regular |  |  |  |  | 118 |
| A105 Solvent Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 117 |
| A105 Nikon L200 | Optical Microscopes |  |  | Regular |  |  |  |  | 123 |
| A105 Develop Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 116 |
| A104 EBL Spinner Right | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 110 |
| A104 EBL Spinner Left | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 109 |
| A104 EBL Spinner Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 111 |
| A104 EBL Develop Hood Right | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 113 |
| A104 EBL Develop Hood Left | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 112 |
| A103 Spinner Right | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 108 |
| A103 Spinner Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 105 |
| A103 Photomask Bench | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 44 |
| A103 Nikon L200 | Optical Microscopes |  |  | Regular |  |  |  |  | 122 |
| A103 Develop Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 106 |
| A102 Spinner Right | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 102 |
| A102 Spinner Left | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 101 |
| A102 Spinner Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 103 |
| A102 Nikon MM-800 | Optical Microscopes |  |  | Regular |  |  |  |  | 121 |
| A102 Develop Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 104 |
| A101 Leica MZ7 | Optical Microscopes |  |  | Regular |  |  |  |  | 119 |
| A101 Busch & Lomb | Optical Microscopes |  |  | Regular |  |  |  |  | 120 |
| 790 RIE Right | Dry Etch |  |  | Regular |  |  |  |  | 130 |
| 790 RIE Nitride Left | Dry Etch |  |  | Regular |  |  |  |  | 131 |
| 790 RIE Middle | Dry Etch |  |  | Regular |  |  |  |  | 129 |
| 4Wave Cluster Sputter | Physical Vapor Deposition |  |  | Regular |  |  |  |  | 63 |
| Dicing saw | Packaging |  |  | Regular |  |  |  |  | 3 |
| PECVD | Chemical Vapor Deposition |  |  | Regular |  |  |  |  | 2 |