NEMO-CE

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Action: 0 of 37 selected

Name	category	operation mode	4 ID
A102 Spinner Hood	Lithography/Spin-Develop	Regular	103
A102 Develop Hood	Lithography/Spin-Develop	Regular	104
A103 Spinner Hood	Lithography/Spin-Develop	Regular	105
A103 Develop Hood	Lithography/Spin-Develop	Regular	106
A103 Spinner Right	Lithography/Spin-Develop	Regular	108
A104 EBL Spinner Left	Lithography/Spin-Develop	Regular	109
A104 EBL Spinner Right	Lithography/Spin-Develop	Regular	110
A104 EBL Spinner Hood	Lithography/Spin-Develop	Regular	111
A104 EBL Develop Hood Left	Lithography/Spin-Develop	Regular	112
A104 EBL Develop Hood Right	Lithography/Spin-Develop	Regular	113
B102 Furnace RCA Clean	Furnaces	Regular	114
Filmetrics F50-UV Mapping	Metrology	Regular	115
A105 Develop Hood	Lithography/Spin-Develop	Regular	116
A105 Solvent Hood	Lithography/Spin-Develop	Regular	117
A106 Base Hood	Wet Chemistry	Regular	118
A101 Leica MZ7	Optical Microscopes	Regular	119
A101 Busch & Lomb	Optical Microscopes	Regular	120
A102 Nikon MM-800	Optical Microscopes	Regular	121
A103 Nikon L200	Optical Microscopes	Regular	122
A105 Nikon L200	Optical Microscopes	Regular	123
B107 Nikon L200	Optical Microscopes	Regular	124
B107 Nikon SMZ1500	Optical Microscopes	Regular	125
B101 Acid Hood	Wet Chemistry	Regular	126
B102 Solvent Hood	Wet Chemistry	Regular	127
B104 Solvent Hood	Wet Chemistry	Regular	128
790 RIE Middle	Dry Etch	Regular	129
790 RIE Right	Dry Etch	Regular	130
790 RIE Nitride Left	Dry Etch	Regular	131
E-Beam and Thermal Evaporator	Physical Vapor Deposition	Regular	132
E-Beam Evaporator	Physical Vapor Deposition	Regular	133
Oxford Metal Etcher	Dry Etch	Regular	134
Oxford Silicon Etcher	Dry Etch	Regular	135
Oxford III-V Etcher	Dry Etch	Regular	136
Gemini 500 FESEM	Imaging and Analysis	Regular	137
4Wave Cluster Sputter	Physical Vapor Deposition	Regular	63
Dicing saw	Packaging	Regular	3
PECVD	Chemical Vapor Deposition	Regular	2

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