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Action: 0 of 100 selected

Name	5 category	2 operation mode	3 ID
Sinter	Gen Furnaces	Regular	1
Unaxis Deep Si Etcher	Dry Etch	Regular	5
Unaxis ICP Etcher	Dry Etch	Regular	9
TITAN TEM	Imaging and Analysis	Regular	11
FEI FIB 1	Focused Ion Beams	Regular	13
FEI FIB 2	Focused Ion Beams	Regular	14
B102 Acid Hood	Wet Chemistry	Regular	43
Flip Chip Bonder	Packaging	Regular	52
Downstream Asher	Dry Etch	Regular	66
SSEC Piranha 2	Wet Chemistry	Regular	80
Dynatex GSX Scribe and Break	Packaging	Regular	89
LHL Tube 4 LTO	Furnaces	Regular	100
A103 Spinner Left	Lithography/Spin-Develop	Regular	107
PECVD	Chemical Vapor Deposition	Regular	2
Dicing saw	Packaging	Regular	3
Atomic Layer Deposition	Chemical Vapor Deposition	Regular	4
XeF2 Silicon Etcher	Dry Etch	Regular	6
Microwave Asher	Dry Etch	Regular	7
Ion Mill	Dry Etch	Regular	8
ZEISS FESEM	Imaging and Analysis	Regular	10
Veeco AFM	Imaging and Analysis	Regular	12
JEOL E-beam	Lithography	Regular	15
ASML Stepper	Lithography	Regular	16
SussMA6	Lithography	Regular	17
SussMA8	Lithography	Regular	18
HMDS Prime	Lithography	Regular	19
Hotplate 1	Lithography	Regular	20
Hotplate 2	Lithography	Regular	21
Vac Oven 1	Lithography	Regular	22
Vac Oven 2	Lithography	Regular	23
Vac Oven 3	Lithography	Regular	24
Laser Mask Writer	Lithography	Regular	25
Nano-imprinter	Lithography	Regular	26
Gold Wire Bonder	Packaging	Regular	27
Film Stress	Metrology	Regular	28
Goniometer	Metrology	Regular	29
Ellipsometer	Metrology	Regular	30
Dektak XT 1	Metrology	Regular	31
Sputter B104 Left	Physical Vapor Deposition	Regular	32
Sputter B104 Right	Physical Vapor Deposition	Regular	33
Parylene Deposition	Physical Vapor Deposition	Regular	34
Wafer Bonder	Specialty Tools	Regular	35
Critical Point Dryer 1	Specialty Tools	Regular	36
Critical Point Dryer 2	Specialty Tools	Regular	37
CMP	Specialty Tools	Regular	38
B101 RCA Bench	Wet Chemistry	Regular	39
B101 Hot Phos Bench	Wet Chemistry	Regular	40
B101 KOH Bench	Wet Chemistry	Regular	41
B101 Solvent Hood	Wet Chemistry	Regular	42
A103 Photomask Bench	Lithography/Spin-Develop	Regular	44
ASML Design Station	Lithography	Regular	45
Metal Liftoff	Wet Chemistry	Regular	46
Parametric Test	Metrology	Regular	47
B102 Spin Rinse Dryer	Wet Chemistry	Regular	48
XRD	Metrology	Regular	49
Asylum AFM	Imaging and Analysis	Regular	50
Aluminum Wire Bonder	Packaging	Regular	51
Bruker AFM	Imaging and Analysis	Regular	53
B101 Spin Rinse Dryer	Wet Chemistry	Regular	54
SPTS HF Vapor Etcher	Wet Chemistry	Regular	55
Wyatt DLS	Metrology	Regular	56
NanoMill	Imaging and Analysis	Regular	57
SPTS Deep Si Etch	Dry Etch	Regular	58
JEOL E-beam Cleanroom	Lithography	Regular	59
Filmetrics F40-UV	Metrology	Regular	60
NanoSpec	Metrology	Regular	61
Jandel 4pt Probe	Metrology	Regular	62
4Wave Cluster Sputter	Physical Vapor Deposition	Regular	63
Suss Resist Coater	Lithography	Regular	64
Suss Resist Developer	Lithography	Regular	65
Four Dimensions 4pt Probe	Metrology	Regular	67
Dektak XT 2	Metrology	Regular	68
Leica EM GP	Imaging and Analysis	Regular	69
PDMS Spin Coater	Soft Lithography	Regular	70
PDMS Mixer	Soft Lithography	Regular	71
PDMS Plasma Bonder	Soft Lithography	Regular	72
PDMS Curing Oven 1	Soft Lithography	Regular	73
PDMS Puncher	Soft Lithography	Regular	74
Microfluidic Test Station	Soft Lithography	Regular	75
Silanization Oven	Soft Lithography	Regular	76
PDMS Curing Oven 2	Soft Lithography	Regular	77
AnnealSys RTA	Furnaces	Regular	78
SSEC Piranha 1	Wet Chemistry	Regular	79
SSEC RCA	Wet Chemistry	Regular	81
Hall Effect Measurement	Metrology	Regular	82
Nano Enclosure	Specialty Tools	Regular	83
DUV Resist Stabilizer	Lithography	Regular	84
MLA 150	Lithography	Regular	85
Nitrogen Oven	Lithography	Regular	86
Wafer Cleaner	Specialty Tools	Regular	87
Mercury Probe	Metrology	Regular	88
RHL Tube 1 Oxide	Furnaces	Regular	90
RHL Tube 2 Anneal	Furnaces	Regular	91
RHL Tube 3 Nitride	Furnaces	Regular	92
RHL Tube 4 Poly	Furnaces	Regular	93
LHL Tube 1 Oxide	Furnaces	Regular	94
LHL Tube 2 Anneal	Furnaces	Regular	95
LHL Tube 3 Nitride	Furnaces	Regular	96
Sensofar Optical Profilometer	Metrology	Regular	97
Glow Discharge	Imaging and Analysis	Regular	98

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