NEMO-CE

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Action: 0 of 37 selected

6 Name	category	operation mode	3 ID
Metal Liftoff	Wet Chemistry	Regular	46
ASML Design Station	Lithography	Regular	45
A103 Photomask Bench	Lithography/Spin-Develop	Regular	44
B101 Solvent Hood	Wet Chemistry	Regular	42
B101 KOH Bench	Wet Chemistry	Regular	41
B101 Hot Phos Bench	Wet Chemistry	Regular	40
B101 RCA Bench	Wet Chemistry	Regular	39
CMP	Specialty Tools	Regular	38
Critical Point Dryer 2	Specialty Tools	Regular	37
Critical Point Dryer 1	Specialty Tools	Regular	36
Wafer Bonder	Specialty Tools	Regular	35
Parylene Deposition	Physical Vapor Deposition	Regular	34
Sputter B104 Right	Physical Vapor Deposition	Regular	33
Sputter B104 Left	Physical Vapor Deposition	Regular	32
Dektak XT 1	Metrology	Regular	31
Ellipsometer	Metrology	Regular	30
Goniometer	Metrology	Regular	29
Film Stress	Metrology	Regular	28
Gold Wire Bonder	Packaging	Regular	27
Nano-imprinter	Lithography	Regular	26
Laser Mask Writer	Lithography	Regular	25
Vac Oven 3	Lithography	Regular	24
Vac Oven 2	Lithography	Regular	23
Vac Oven 1	Lithography	Regular	22
Hotplate 2	Lithography	Regular	21
Hotplate 1	Lithography	Regular	20
HMDS Prime	Lithography	Regular	19
SussMA8	Lithography	Regular	18
SussMA6	Lithography	Regular	17
ASML Stepper	Lithography	Regular	16
JEOL E-beam	Lithography	Regular	15
Veeco AFM	Imaging and Analysis	Regular	12
ZEISS FESEM	Imaging and Analysis	Regular	10
Ion Mill	Dry Etch	Regular	8
Microwave Asher	Dry Etch	Regular	7
XeF2 Silicon Etcher	Dry Etch	Regular	6
Atomic Layer Deposition	Chemical Vapor Deposition	Regular	4

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