| Hotplate 2 | Lithography |  |  | Regular |  |  |  |  | 21 |
| Hotplate 1 | Lithography |  |  | Regular |  |  |  |  | 20 |
| HMDS Prime | Lithography |  |  | Regular |  |  |  |  | 19 |
| SussMA8 | Lithography |  |  | Regular |  |  |  |  | 18 |
| SussMA6 | Lithography |  |  | Regular |  |  |  |  | 17 |
| ASML Stepper | Lithography |  |  | Regular |  |  |  |  | 16 |
| JEOL E-beam | Lithography |  |  | Regular |  |  |  |  | 15 |
| Gemini 500 FESEM | Imaging and Analysis |  |  | Regular |  |  |  |  | 137 |
| Glow Discharge | Imaging and Analysis |  |  | Regular |  |  |  |  | 98 |
| Leica EM GP | Imaging and Analysis |  |  | Regular |  |  |  |  | 69 |
| NanoMill | Imaging and Analysis |  |  | Regular |  |  |  |  | 57 |
| Bruker AFM | Imaging and Analysis |  |  | Regular |  |  |  |  | 53 |
| Asylum AFM | Imaging and Analysis |  |  | Regular |  |  |  |  | 50 |
| Veeco AFM | Imaging and Analysis |  |  | Regular |  |  |  |  | 12 |
| ZEISS FESEM | Imaging and Analysis |  |  | Regular |  |  |  |  | 10 |
| B102 Furnace RCA Clean | Furnaces |  |  | Regular |  |  |  |  | 114 |
| LHL Tube 3 Nitride | Furnaces |  |  | Regular |  |  |  |  | 96 |
| LHL Tube 2 Anneal | Furnaces |  |  | Regular |  |  |  |  | 95 |
| LHL Tube 1 Oxide | Furnaces |  |  | Regular |  |  |  |  | 94 |
| RHL Tube 4 Poly | Furnaces |  |  | Regular |  |  |  |  | 93 |
| RHL Tube 3 Nitride | Furnaces |  |  | Regular |  |  |  |  | 92 |
| RHL Tube 2 Anneal | Furnaces |  |  | Regular |  |  |  |  | 91 |
| RHL Tube 1 Oxide | Furnaces |  |  | Regular |  |  |  |  | 90 |
| AnnealSys RTA | Furnaces |  |  | Regular |  |  |  |  | 78 |
| Oxford III-V Etcher | Dry Etch |  |  | Regular |  |  |  |  | 136 |
| Oxford Silicon Etcher | Dry Etch |  |  | Regular |  |  |  |  | 135 |
| Oxford Metal Etcher | Dry Etch |  |  | Regular |  |  |  |  | 134 |
| 790 RIE Nitride Left | Dry Etch |  |  | Regular |  |  |  |  | 131 |
| 790 RIE Middle | Dry Etch |  |  | Regular |  |  |  |  | 129 |
| SPTS Deep Si Etch | Dry Etch |  |  | Regular |  |  |  |  | 58 |
| Ion Mill | Dry Etch |  |  | Regular |  |  |  |  | 8 |
| Microwave Asher | Dry Etch |  |  | Regular |  |  |  |  | 7 |
| XeF2 Silicon Etcher | Dry Etch |  |  | Regular |  |  |  |  | 6 |
| Atomic Layer Deposition | Chemical Vapor Deposition |  |  | Regular |  |  |  |  | 4 |
| Dicing saw | Packaging |  |  | Regular |  |  |  |  | 3 |
| PECVD | Chemical Vapor Deposition |  |  | Regular |  |  |  |  | 2 |
| 4Wave Cluster Sputter | Physical Vapor Deposition |  |  | Regular |  |  |  |  | 63 |