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Action: 0 of 37 selected

4 Name	category	1 operation mode	6 ID
B101 KOH Bench	Wet Chemistry	Regular	41
B101 Hot Phos Bench	Wet Chemistry	Regular	40
B101 Acid Hood	Wet Chemistry	Regular	126
Atomic Layer Deposition	Chemical Vapor Deposition	Regular	4
Asylum AFM	Imaging and Analysis	Regular	50
AnnealSys RTA	Furnaces	Regular	78
Aluminum Wire Bonder	Packaging	Regular	51
ASML Stepper	Lithography	Regular	16
ASML Design Station	Lithography	Regular	45
A106 Base Hood	Wet Chemistry	Regular	118
A105 Solvent Hood	Lithography/Spin-Develop	Regular	117
A105 Nikon L200	Optical Microscopes	Regular	123
A105 Develop Hood	Lithography/Spin-Develop	Regular	116
A104 EBL Spinner Right	Lithography/Spin-Develop	Regular	110
A104 EBL Spinner Left	Lithography/Spin-Develop	Regular	109
A104 EBL Spinner Hood	Lithography/Spin-Develop	Regular	111
A104 EBL Develop Hood Right	Lithography/Spin-Develop	Regular	113
A104 EBL Develop Hood Left	Lithography/Spin-Develop	Regular	112
A103 Spinner Right	Lithography/Spin-Develop	Regular	108
A103 Spinner Hood	Lithography/Spin-Develop	Regular	105
A103 Photomask Bench	Lithography/Spin-Develop	Regular	44
A103 Nikon L200	Optical Microscopes	Regular	122
A103 Develop Hood	Lithography/Spin-Develop	Regular	106
A102 Spinner Right	Lithography/Spin-Develop	Regular	102
A102 Spinner Left	Lithography/Spin-Develop	Regular	101
A102 Spinner Hood	Lithography/Spin-Develop	Regular	103
A102 Nikon MM-800	Optical Microscopes	Regular	121
A102 Develop Hood	Lithography/Spin-Develop	Regular	104
A101 Leica MZ7	Optical Microscopes	Regular	119
A101 Busch & Lomb	Optical Microscopes	Regular	120
790 RIE Right	Dry Etch	Regular	130
790 RIE Nitride Left	Dry Etch	Regular	131
790 RIE Middle	Dry Etch	Regular	129
4Wave Cluster Sputter	Physical Vapor Deposition	Regular	63
Dicing saw	Packaging	Regular	3
Sinter	Gen Furnaces	Regular	1
PECVD	Chemical Vapor Deposition	Regular	2

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