NEMO-CE

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Action: 0 of 100 selected

Name	3 category	2 operation mode	ID
B104 Solvent Hood	Wet Chemistry	Regular	128
B102 Solvent Hood	Wet Chemistry	Regular	127
B101 Acid Hood	Wet Chemistry	Regular	126
A106 Base Hood	Wet Chemistry	Regular	118
SSEC RCA	Wet Chemistry	Regular	81
SSEC Piranha 1	Wet Chemistry	Regular	79
SPTS HF Vapor Etcher	Wet Chemistry	Regular	55
B101 Spin Rinse Dryer	Wet Chemistry	Regular	54
B102 Spin Rinse Dryer	Wet Chemistry	Regular	48
Metal Liftoff	Wet Chemistry	Regular	46
B101 Solvent Hood	Wet Chemistry	Regular	42
B101 KOH Bench	Wet Chemistry	Regular	41
B101 Hot Phos Bench	Wet Chemistry	Regular	40
B101 RCA Bench	Wet Chemistry	Regular	39
SSEC Piranha 2	Wet Chemistry	Regular	80
B102 Acid Hood	Wet Chemistry	Regular	43
Wafer Cleaner	Specialty Tools	Regular	87
Nano Enclosure	Specialty Tools	Regular	83
CMP	Specialty Tools	Regular	38
Critical Point Dryer 2	Specialty Tools	Regular	37
Critical Point Dryer 1	Specialty Tools	Regular	36
Wafer Bonder	Specialty Tools	Regular	35
PDMS Curing Oven 2	Soft Lithography	Regular	77
Silanization Oven	Soft Lithography	Regular	76
Microfluidic Test Station	Soft Lithography	Regular	75
PDMS Puncher	Soft Lithography	Regular	74
PDMS Curing Oven 1	Soft Lithography	Regular	73
PDMS Plasma Bonder	Soft Lithography	Regular	72
PDMS Mixer	Soft Lithography	Regular	71
PDMS Spin Coater	Soft Lithography	Regular	70
E-Beam Evaporator	Physical Vapor Deposition	Regular	133
E-Beam and Thermal Evaporator	Physical Vapor Deposition	Regular	132
Thermal Thin-Al Evaporator	Physical Vapor Deposition	Regular	99
Parylene Deposition	Physical Vapor Deposition	Regular	34
Sputter B104 Right	Physical Vapor Deposition	Regular	33
Sputter B104 Left	Physical Vapor Deposition	Regular	32
Dicing saw	Packaging	Regular	3
Aluminum Wire Bonder	Packaging	Regular	51
Gold Wire Bonder	Packaging	Regular	27
Dynatex GSX Scribe and Break	Packaging	Regular	89
Flip Chip Bonder	Packaging	Regular	52
B107 Nikon SMZ1500	Optical Microscopes	Regular	125
B107 Nikon L200	Optical Microscopes	Regular	124
A105 Nikon L200	Optical Microscopes	Regular	123
A103 Nikon L200	Optical Microscopes	Regular	122
A102 Nikon MM-800	Optical Microscopes	Regular	121
A101 Busch & Lomb	Optical Microscopes	Regular	120
A101 Leica MZ7	Optical Microscopes	Regular	119
Filmetrics F50-UV Mapping	Metrology	Regular	115
Sensofar Optical Profilometer	Metrology	Regular	97
Mercury Probe	Metrology	Regular	88
Hall Effect Measurement	Metrology	Regular	82
Dektak XT 2	Metrology	Regular	68
Four Dimensions 4pt Probe	Metrology	Regular	67
Jandel 4pt Probe	Metrology	Regular	62
NanoSpec	Metrology	Regular	61
Filmetrics F40-UV	Metrology	Regular	60
Wyatt DLS	Metrology	Regular	56
XRD	Metrology	Regular	49
Parametric Test	Metrology	Regular	47
Dektak XT 1	Metrology	Regular	31
Ellipsometer	Metrology	Regular	30
Goniometer	Metrology	Regular	29
Film Stress	Metrology	Regular	28
A105 Solvent Hood	Lithography/Spin-Develop	Regular	117
A105 Develop Hood	Lithography/Spin-Develop	Regular	116
A104 EBL Develop Hood Right	Lithography/Spin-Develop	Regular	113
A104 EBL Develop Hood Left	Lithography/Spin-Develop	Regular	112
A104 EBL Spinner Hood	Lithography/Spin-Develop	Regular	111
A104 EBL Spinner Right	Lithography/Spin-Develop	Regular	110
A104 EBL Spinner Left	Lithography/Spin-Develop	Regular	109
A103 Spinner Right	Lithography/Spin-Develop	Regular	108
A103 Develop Hood	Lithography/Spin-Develop	Regular	106
A103 Spinner Hood	Lithography/Spin-Develop	Regular	105
A102 Develop Hood	Lithography/Spin-Develop	Regular	104
A102 Spinner Hood	Lithography/Spin-Develop	Regular	103
A102 Spinner Right	Lithography/Spin-Develop	Regular	102
A102 Spinner Left	Lithography/Spin-Develop	Regular	101
A103 Photomask Bench	Lithography/Spin-Develop	Regular	44
A103 Spinner Left	Lithography/Spin-Develop	Regular	107
Nitrogen Oven	Lithography	Regular	86
MLA 150	Lithography	Regular	85
DUV Resist Stabilizer	Lithography	Regular	84
Suss Resist Developer	Lithography	Regular	65
Suss Resist Coater	Lithography	Regular	64
JEOL E-beam Cleanroom	Lithography	Regular	59
ASML Design Station	Lithography	Regular	45
Nano-imprinter	Lithography	Regular	26
Laser Mask Writer	Lithography	Regular	25
Vac Oven 3	Lithography	Regular	24
Vac Oven 2	Lithography	Regular	23
Vac Oven 1	Lithography	Regular	22
Hotplate 2	Lithography	Regular	21
Hotplate 1	Lithography	Regular	20
HMDS Prime	Lithography	Regular	19
SussMA8	Lithography	Regular	18
SussMA6	Lithography	Regular	17
ASML Stepper	Lithography	Regular	16
JEOL E-beam	Lithography	Regular	15
Gemini 500 FESEM	Imaging and Analysis	Regular	137

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