NEMO-CE

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Action: 0 of 37 selected

6 Name	category	operation mode	4 ID
Ellipsometer	Metrology	Regular	30
Goniometer	Metrology	Regular	29
Film Stress	Metrology	Regular	28
Gold Wire Bonder	Packaging	Regular	27
Nano-imprinter	Lithography	Regular	26
Laser Mask Writer	Lithography	Regular	25
Vac Oven 3	Lithography	Regular	24
Vac Oven 2	Lithography	Regular	23
Vac Oven 1	Lithography	Regular	22
Hotplate 2	Lithography	Regular	21
Hotplate 1	Lithography	Regular	20
HMDS Prime	Lithography	Regular	19
SussMA8	Lithography	Regular	18
SussMA6	Lithography	Regular	17
ASML Stepper	Lithography	Regular	16
JEOL E-beam	Lithography	Regular	15
Veeco AFM	Imaging and Analysis	Regular	12
ZEISS FESEM	Imaging and Analysis	Regular	10
Ion Mill	Dry Etch	Regular	8
Microwave Asher	Dry Etch	Regular	7
XeF2 Silicon Etcher	Dry Etch	Regular	6
Atomic Layer Deposition	Chemical Vapor Deposition	Regular	4
A103 Spinner Left	Lithography/Spin-Develop	Regular	107
LHL Tube 4 LTO	Furnaces	Regular	100
Dynatex GSX Scribe and Break	Packaging	Regular	89
SSEC Piranha 2	Wet Chemistry	Regular	80
Downstream Asher	Dry Etch	Regular	66
Flip Chip Bonder	Packaging	Regular	52
B102 Acid Hood	Wet Chemistry	Regular	43
FEI FIB 2	Focused Ion Beams	Regular	14
FEI FIB 1	Focused Ion Beams	Regular	13
TITAN TEM	Imaging and Analysis	Regular	11
Unaxis ICP Etcher	Dry Etch	Regular	9
Unaxis Deep Si Etcher	Dry Etch	Regular	5
CMP	Specialty Tools	Regular	38
790 RIE Right	Dry Etch	Regular	130
4Wave Cluster Sputter	Physical Vapor Deposition	Regular	63

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