NEMO-CE

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Action: 0 of 100 selected

8 Name	2 category	3 operation mode	ID
Atomic Layer Deposition	Chemical Vapor Deposition	Regular	4
PECVD	Chemical Vapor Deposition	Regular	2
790 RIE Middle	Dry Etch	Regular	129
790 RIE Nitride Left	Dry Etch	Regular	131
790 RIE Right	Dry Etch	Regular	130
Ion Mill	Dry Etch	Regular	8
Microwave Asher	Dry Etch	Regular	7
Oxford III-V Etcher	Dry Etch	Regular	136
Oxford Metal Etcher	Dry Etch	Regular	134
Oxford Silicon Etcher	Dry Etch	Regular	135
SPTS Deep Si Etch	Dry Etch	Regular	58
XeF2 Silicon Etcher	Dry Etch	Regular	6
AnnealSys RTA	Furnaces	Regular	78
B102 Furnace RCA Clean	Furnaces	Regular	114
LHL Tube 1 Oxide	Furnaces	Regular	94
LHL Tube 2 Anneal	Furnaces	Regular	95
LHL Tube 3 Nitride	Furnaces	Regular	96
RHL Tube 1 Oxide	Furnaces	Regular	90
RHL Tube 2 Anneal	Furnaces	Regular	91
RHL Tube 3 Nitride	Furnaces	Regular	92
RHL Tube 4 Poly	Furnaces	Regular	93
Asylum AFM	Imaging and Analysis	Regular	50
Bruker AFM	Imaging and Analysis	Regular	53
Gemini 500 FESEM	Imaging and Analysis	Regular	137
Glow Discharge	Imaging and Analysis	Regular	98
Leica EM GP	Imaging and Analysis	Regular	69
NanoMill	Imaging and Analysis	Regular	57
Veeco AFM	Imaging and Analysis	Regular	12
ZEISS FESEM	Imaging and Analysis	Regular	10
ASML Design Station	Lithography	Regular	45
ASML Stepper	Lithography	Regular	16
DUV Resist Stabilizer	Lithography	Regular	84
HMDS Prime	Lithography	Regular	19
Hotplate 1	Lithography	Regular	20
Hotplate 2	Lithography	Regular	21
JEOL E-beam	Lithography	Regular	15
JEOL E-beam Cleanroom	Lithography	Regular	59
Laser Mask Writer	Lithography	Regular	25
MLA 150	Lithography	Regular	85
Nano-imprinter	Lithography	Regular	26
Nitrogen Oven	Lithography	Regular	86
SussMA6	Lithography	Regular	17
SussMA8	Lithography	Regular	18
Suss Resist Coater	Lithography	Regular	64
Suss Resist Developer	Lithography	Regular	65
Vac Oven 1	Lithography	Regular	22
Vac Oven 2	Lithography	Regular	23
Vac Oven 3	Lithography	Regular	24
A102 Develop Hood	Lithography/Spin-Develop	Regular	104
A102 Spinner Hood	Lithography/Spin-Develop	Regular	103
A102 Spinner Left	Lithography/Spin-Develop	Regular	101
A102 Spinner Right	Lithography/Spin-Develop	Regular	102
A103 Develop Hood	Lithography/Spin-Develop	Regular	106
A103 Photomask Bench	Lithography/Spin-Develop	Regular	44
A103 Spinner Hood	Lithography/Spin-Develop	Regular	105
A103 Spinner Right	Lithography/Spin-Develop	Regular	108
A104 EBL Develop Hood Left	Lithography/Spin-Develop	Regular	112
A104 EBL Develop Hood Right	Lithography/Spin-Develop	Regular	113
A104 EBL Spinner Hood	Lithography/Spin-Develop	Regular	111
A104 EBL Spinner Left	Lithography/Spin-Develop	Regular	109
A104 EBL Spinner Right	Lithography/Spin-Develop	Regular	110
A105 Develop Hood	Lithography/Spin-Develop	Regular	116
A105 Solvent Hood	Lithography/Spin-Develop	Regular	117
Dektak XT 1	Metrology	Regular	31
Dektak XT 2	Metrology	Regular	68
Ellipsometer	Metrology	Regular	30
Filmetrics F40-UV	Metrology	Regular	60
Filmetrics F50-UV Mapping	Metrology	Regular	115
Film Stress	Metrology	Regular	28
Four Dimensions 4pt Probe	Metrology	Regular	67
Goniometer	Metrology	Regular	29
Hall Effect Measurement	Metrology	Regular	82
Jandel 4pt Probe	Metrology	Regular	62
Mercury Probe	Metrology	Regular	88
NanoSpec	Metrology	Regular	61
Parametric Test	Metrology	Regular	47
Sensofar Optical Profilometer	Metrology	Regular	97
Wyatt DLS	Metrology	Regular	56
XRD	Metrology	Regular	49
A101 Busch & Lomb	Optical Microscopes	Regular	120
A101 Leica MZ7	Optical Microscopes	Regular	119
A102 Nikon MM-800	Optical Microscopes	Regular	121
A103 Nikon L200	Optical Microscopes	Regular	122
A105 Nikon L200	Optical Microscopes	Regular	123
B107 Nikon L200	Optical Microscopes	Regular	124
B107 Nikon SMZ1500	Optical Microscopes	Regular	125
Aluminum Wire Bonder	Packaging	Regular	51
Gold Wire Bonder	Packaging	Regular	27
Dicing saw	Packaging	Regular	3
4Wave Cluster Sputter	Physical Vapor Deposition	Regular	63
E-Beam and Thermal Evaporator	Physical Vapor Deposition	Regular	132
E-Beam Evaporator	Physical Vapor Deposition	Regular	133
Parylene Deposition	Physical Vapor Deposition	Regular	34
Sputter B104 Left	Physical Vapor Deposition	Regular	32
Sputter B104 Right	Physical Vapor Deposition	Regular	33
Thermal Thin-Al Evaporator	Physical Vapor Deposition	Regular	99
Microfluidic Test Station	Soft Lithography	Regular	75
PDMS Curing Oven 1	Soft Lithography	Regular	73
PDMS Curing Oven 2	Soft Lithography	Regular	77
PDMS Mixer	Soft Lithography	Regular	71

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