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Action: 0 of 100 selected

7 Name	4 category	operation mode	3 ID
PECVD	Chemical Vapor Deposition	Regular	2
Dicing saw	Packaging	Regular	3
Gemini 500 FESEM	Imaging and Analysis	Regular	137
Oxford III-V Etcher	Dry Etch	Regular	136
Oxford Silicon Etcher	Dry Etch	Regular	135
Oxford Metal Etcher	Dry Etch	Regular	134
E-Beam Evaporator	Physical Vapor Deposition	Regular	133
E-Beam and Thermal Evaporator	Physical Vapor Deposition	Regular	132
790 RIE Nitride Left	Dry Etch	Regular	131
790 RIE Right	Dry Etch	Regular	130
790 RIE Middle	Dry Etch	Regular	129
B104 Solvent Hood	Wet Chemistry	Regular	128
B102 Solvent Hood	Wet Chemistry	Regular	127
B101 Acid Hood	Wet Chemistry	Regular	126
B107 Nikon SMZ1500	Optical Microscopes	Regular	125
B107 Nikon L200	Optical Microscopes	Regular	124
A105 Nikon L200	Optical Microscopes	Regular	123
A103 Nikon L200	Optical Microscopes	Regular	122
A102 Nikon MM-800	Optical Microscopes	Regular	121
A101 Busch & Lomb	Optical Microscopes	Regular	120
A101 Leica MZ7	Optical Microscopes	Regular	119
A106 Base Hood	Wet Chemistry	Regular	118
A105 Solvent Hood	Lithography/Spin-Develop	Regular	117
A105 Develop Hood	Lithography/Spin-Develop	Regular	116
Filmetrics F50-UV Mapping	Metrology	Regular	115
B102 Furnace RCA Clean	Furnaces	Regular	114
A104 EBL Develop Hood Right	Lithography/Spin-Develop	Regular	113
A104 EBL Develop Hood Left	Lithography/Spin-Develop	Regular	112
A104 EBL Spinner Hood	Lithography/Spin-Develop	Regular	111
A104 EBL Spinner Right	Lithography/Spin-Develop	Regular	110
A104 EBL Spinner Left	Lithography/Spin-Develop	Regular	109
A103 Spinner Right	Lithography/Spin-Develop	Regular	108
A103 Develop Hood	Lithography/Spin-Develop	Regular	106
A103 Spinner Hood	Lithography/Spin-Develop	Regular	105
A102 Develop Hood	Lithography/Spin-Develop	Regular	104
A102 Spinner Hood	Lithography/Spin-Develop	Regular	103
A102 Spinner Right	Lithography/Spin-Develop	Regular	102
A102 Spinner Left	Lithography/Spin-Develop	Regular	101
Thermal Thin-Al Evaporator	Physical Vapor Deposition	Regular	99
Glow Discharge	Imaging and Analysis	Regular	98
Sensofar Optical Profilometer	Metrology	Regular	97
LHL Tube 3 Nitride	Furnaces	Regular	96
LHL Tube 2 Anneal	Furnaces	Regular	95
LHL Tube 1 Oxide	Furnaces	Regular	94
RHL Tube 4 Poly	Furnaces	Regular	93
RHL Tube 3 Nitride	Furnaces	Regular	92
RHL Tube 2 Anneal	Furnaces	Regular	91
RHL Tube 1 Oxide	Furnaces	Regular	90
Mercury Probe	Metrology	Regular	88
Wafer Cleaner	Specialty Tools	Regular	87
Nitrogen Oven	Lithography	Regular	86
MLA 150	Lithography	Regular	85
DUV Resist Stabilizer	Lithography	Regular	84
Nano Enclosure	Specialty Tools	Regular	83
Hall Effect Measurement	Metrology	Regular	82
SSEC RCA	Wet Chemistry	Regular	81
SSEC Piranha 1	Wet Chemistry	Regular	79
AnnealSys RTA	Furnaces	Regular	78
PDMS Curing Oven 2	Soft Lithography	Regular	77
Silanization Oven	Soft Lithography	Regular	76
Microfluidic Test Station	Soft Lithography	Regular	75
PDMS Puncher	Soft Lithography	Regular	74
PDMS Curing Oven 1	Soft Lithography	Regular	73
PDMS Plasma Bonder	Soft Lithography	Regular	72
PDMS Mixer	Soft Lithography	Regular	71
PDMS Spin Coater	Soft Lithography	Regular	70
Leica EM GP	Imaging and Analysis	Regular	69
Dektak XT 2	Metrology	Regular	68
Four Dimensions 4pt Probe	Metrology	Regular	67
Suss Resist Developer	Lithography	Regular	65
Suss Resist Coater	Lithography	Regular	64
4Wave Cluster Sputter	Physical Vapor Deposition	Regular	63
Jandel 4pt Probe	Metrology	Regular	62
NanoSpec	Metrology	Regular	61
Filmetrics F40-UV	Metrology	Regular	60
JEOL E-beam Cleanroom	Lithography	Regular	59
SPTS Deep Si Etch	Dry Etch	Regular	58
NanoMill	Imaging and Analysis	Regular	57
Wyatt DLS	Metrology	Regular	56
SPTS HF Vapor Etcher	Wet Chemistry	Regular	55
B101 Spin Rinse Dryer	Wet Chemistry	Regular	54
Bruker AFM	Imaging and Analysis	Regular	53
Aluminum Wire Bonder	Packaging	Regular	51
Asylum AFM	Imaging and Analysis	Regular	50
XRD	Metrology	Regular	49
B102 Spin Rinse Dryer	Wet Chemistry	Regular	48
Parametric Test	Metrology	Regular	47
Metal Liftoff	Wet Chemistry	Regular	46
ASML Design Station	Lithography	Regular	45
A103 Photomask Bench	Lithography/Spin-Develop	Regular	44
B101 Solvent Hood	Wet Chemistry	Regular	42
B101 KOH Bench	Wet Chemistry	Regular	41
B101 Hot Phos Bench	Wet Chemistry	Regular	40
B101 RCA Bench	Wet Chemistry	Regular	39
CMP	Specialty Tools	Regular	38
Critical Point Dryer 2	Specialty Tools	Regular	37
Critical Point Dryer 1	Specialty Tools	Regular	36
Wafer Bonder	Specialty Tools	Regular	35
Parylene Deposition	Physical Vapor Deposition	Regular	34
Sputter B104 Right	Physical Vapor Deposition	Regular	33

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