NEMO-CE

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Action: 0 of 100 selected

1 Name	category	operation mode	6 ID
4Wave Cluster Sputter	Physical Vapor Deposition	Regular	63
790 RIE Middle	Dry Etch	Regular	129
790 RIE Nitride Left	Dry Etch	Regular	131
790 RIE Right	Dry Etch	Regular	130
A101 Busch & Lomb	Optical Microscopes	Regular	120
A101 Leica MZ7	Optical Microscopes	Regular	119
A102 Develop Hood	Lithography/Spin-Develop	Regular	104
A102 Nikon MM-800	Optical Microscopes	Regular	121
A102 Spinner Hood	Lithography/Spin-Develop	Regular	103
A102 Spinner Left	Lithography/Spin-Develop	Regular	101
A102 Spinner Right	Lithography/Spin-Develop	Regular	102
A103 Develop Hood	Lithography/Spin-Develop	Regular	106
A103 Nikon L200	Optical Microscopes	Regular	122
A103 Photomask Bench	Lithography/Spin-Develop	Regular	44
A103 Spinner Hood	Lithography/Spin-Develop	Regular	105
A103 Spinner Left	Lithography/Spin-Develop	Regular	107
A103 Spinner Right	Lithography/Spin-Develop	Regular	108
A104 EBL Develop Hood Left	Lithography/Spin-Develop	Regular	112
A104 EBL Develop Hood Right	Lithography/Spin-Develop	Regular	113
A104 EBL Spinner Hood	Lithography/Spin-Develop	Regular	111
A104 EBL Spinner Left	Lithography/Spin-Develop	Regular	109
A104 EBL Spinner Right	Lithography/Spin-Develop	Regular	110
A105 Develop Hood	Lithography/Spin-Develop	Regular	116
A105 Nikon L200	Optical Microscopes	Regular	123
A105 Solvent Hood	Lithography/Spin-Develop	Regular	117
A106 Base Hood	Wet Chemistry	Regular	118
ASML Design Station	Lithography	Regular	45
ASML Stepper	Lithography	Regular	16
Aluminum Wire Bonder	Packaging	Regular	51
AnnealSys RTA	Furnaces	Regular	78
Asylum AFM	Imaging and Analysis	Regular	50
Atomic Layer Deposition	Chemical Vapor Deposition	Regular	4
B101 Acid Hood	Wet Chemistry	Regular	126
B101 Hot Phos Bench	Wet Chemistry	Regular	40
B101 KOH Bench	Wet Chemistry	Regular	41
B101 RCA Bench	Wet Chemistry	Regular	39
B101 Solvent Hood	Wet Chemistry	Regular	42
B101 Spin Rinse Dryer	Wet Chemistry	Regular	54
B102 Acid Hood	Wet Chemistry	Regular	43
B102 Furnace RCA Clean	Furnaces	Regular	114
B102 Solvent Hood	Wet Chemistry	Regular	127
B102 Spin Rinse Dryer	Wet Chemistry	Regular	48
B104 Solvent Hood	Wet Chemistry	Regular	128
B107 Nikon L200	Optical Microscopes	Regular	124
B107 Nikon SMZ1500	Optical Microscopes	Regular	125
Bruker AFM	Imaging and Analysis	Regular	53
CMP	Specialty Tools	Regular	38
Critical Point Dryer 1	Specialty Tools	Regular	36
Critical Point Dryer 2	Specialty Tools	Regular	37
DUV Resist Stabilizer	Lithography	Regular	84
Dektak XT 1	Metrology	Regular	31
Dektak XT 2	Metrology	Regular	68
Dicing saw	Packaging	Regular	3
Downstream Asher	Dry Etch	Regular	66
Dynatex GSX Scribe and Break	Packaging	Regular	89
E-Beam Evaporator	Physical Vapor Deposition	Regular	133
E-Beam and Thermal Evaporator	Physical Vapor Deposition	Regular	132
Ellipsometer	Metrology	Regular	30
FEI FIB 1	Focused Ion Beams	Regular	13
FEI FIB 2	Focused Ion Beams	Regular	14
Film Stress	Metrology	Regular	28
Filmetrics F40-UV	Metrology	Regular	60
Filmetrics F50-UV Mapping	Metrology	Regular	115
Flip Chip Bonder	Packaging	Regular	52
Four Dimensions 4pt Probe	Metrology	Regular	67
Gemini 500 FESEM	Imaging and Analysis	Regular	137
Glow Discharge	Imaging and Analysis	Regular	98
Gold Wire Bonder	Packaging	Regular	27
Goniometer	Metrology	Regular	29
HMDS Prime	Lithography	Regular	19
Hall Effect Measurement	Metrology	Regular	82
Hotplate 1	Lithography	Regular	20
Hotplate 2	Lithography	Regular	21
Ion Mill	Dry Etch	Regular	8
JEOL E-beam	Lithography	Regular	15
JEOL E-beam Cleanroom	Lithography	Regular	59
Jandel 4pt Probe	Metrology	Regular	62
LHL Tube 1 Oxide	Furnaces	Regular	94
LHL Tube 2 Anneal	Furnaces	Regular	95
LHL Tube 3 Nitride	Furnaces	Regular	96
LHL Tube 4 LTO	Furnaces	Regular	100
Laser Mask Writer	Lithography	Regular	25
Leica EM GP	Imaging and Analysis	Regular	69
MLA 150	Lithography	Regular	85
Mercury Probe	Metrology	Regular	88
Metal Liftoff	Wet Chemistry	Regular	46
Microfluidic Test Station	Soft Lithography	Regular	75
Microwave Asher	Dry Etch	Regular	7
Nano Enclosure	Specialty Tools	Regular	83
Nano-imprinter	Lithography	Regular	26
NanoMill	Imaging and Analysis	Regular	57
NanoSpec	Metrology	Regular	61
Nitrogen Oven	Lithography	Regular	86
Oxford III-V Etcher	Dry Etch	Regular	136
Oxford Metal Etcher	Dry Etch	Regular	134
Oxford Silicon Etcher	Dry Etch	Regular	135
PDMS Curing Oven 1	Soft Lithography	Regular	73
PDMS Curing Oven 2	Soft Lithography	Regular	77
PDMS Mixer	Soft Lithography	Regular	71
PDMS Plasma Bonder	Soft Lithography	Regular	72

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