| Dicing saw | Packaging |  |  | Regular |  |  |  |  | 3 |
| Sinter | Gen Furnaces |  |  | Regular |  |  |  |  | 1 |
| PECVD | Chemical Vapor Deposition |  |  | Regular |  |  |  |  | 2 |
| Gemini 500 FESEM | Imaging and Analysis |  |  | Regular |  |  |  |  | 137 |
| Oxford III-V Etcher | Dry Etch |  |  | Regular |  |  |  |  | 136 |
| Oxford Silicon Etcher | Dry Etch |  |  | Regular |  |  |  |  | 135 |
| Oxford Metal Etcher | Dry Etch |  |  | Regular |  |  |  |  | 134 |
| E-Beam Evaporator | Physical Vapor Deposition |  |  | Regular |  |  |  |  | 133 |
| E-Beam and Thermal Evaporator | Physical Vapor Deposition |  |  | Regular |  |  |  |  | 132 |
| 790 RIE Nitride Left | Dry Etch |  |  | Regular |  |  |  |  | 131 |
| 790 RIE Middle | Dry Etch |  |  | Regular |  |  |  |  | 129 |
| B104 Solvent Hood | Wet Chemistry |  |  | Regular |  |  |  |  | 128 |
| B102 Solvent Hood | Wet Chemistry |  |  | Regular |  |  |  |  | 127 |
| B101 Acid Hood | Wet Chemistry |  |  | Regular |  |  |  |  | 126 |
| B107 Nikon SMZ1500 | Optical Microscopes |  |  | Regular |  |  |  |  | 125 |
| B107 Nikon L200 | Optical Microscopes |  |  | Regular |  |  |  |  | 124 |
| A105 Nikon L200 | Optical Microscopes |  |  | Regular |  |  |  |  | 123 |
| A103 Nikon L200 | Optical Microscopes |  |  | Regular |  |  |  |  | 122 |
| A102 Nikon MM-800 | Optical Microscopes |  |  | Regular |  |  |  |  | 121 |
| A101 Busch & Lomb | Optical Microscopes |  |  | Regular |  |  |  |  | 120 |
| A101 Leica MZ7 | Optical Microscopes |  |  | Regular |  |  |  |  | 119 |
| A106 Base Hood | Wet Chemistry |  |  | Regular |  |  |  |  | 118 |
| A105 Solvent Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 117 |
| A105 Develop Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 116 |
| Filmetrics F50-UV Mapping | Metrology |  |  | Regular |  |  |  |  | 115 |
| B102 Furnace RCA Clean | Furnaces |  |  | Regular |  |  |  |  | 114 |
| A104 EBL Develop Hood Right | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 113 |
| A104 EBL Develop Hood Left | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 112 |
| A104 EBL Spinner Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 111 |
| A104 EBL Spinner Right | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 110 |
| A104 EBL Spinner Left | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 109 |
| A103 Spinner Right | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 108 |
| A103 Spinner Left | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 107 |
| A103 Develop Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 106 |
| A103 Spinner Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 105 |
| A102 Develop Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 104 |
| A102 Spinner Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 103 |
| A102 Spinner Right | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 102 |
| A102 Spinner Left | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 101 |
| LHL Tube 4 LTO | Furnaces |  |  | Regular |  |  |  |  | 100 |
| Thermal Thin-Al Evaporator | Physical Vapor Deposition |  |  | Regular |  |  |  |  | 99 |
| Glow Discharge | Imaging and Analysis |  |  | Regular |  |  |  |  | 98 |
| Sensofar Optical Profilometer | Metrology |  |  | Regular |  |  |  |  | 97 |
| LHL Tube 3 Nitride | Furnaces |  |  | Regular |  |  |  |  | 96 |
| LHL Tube 2 Anneal | Furnaces |  |  | Regular |  |  |  |  | 95 |
| LHL Tube 1 Oxide | Furnaces |  |  | Regular |  |  |  |  | 94 |
| RHL Tube 4 Poly | Furnaces |  |  | Regular |  |  |  |  | 93 |
| RHL Tube 3 Nitride | Furnaces |  |  | Regular |  |  |  |  | 92 |
| RHL Tube 2 Anneal | Furnaces |  |  | Regular |  |  |  |  | 91 |
| RHL Tube 1 Oxide | Furnaces |  |  | Regular |  |  |  |  | 90 |
| Dynatex GSX Scribe and Break | Packaging |  |  | Regular |  |  |  |  | 89 |
| Mercury Probe | Metrology |  |  | Regular |  |  |  |  | 88 |
| Wafer Cleaner | Specialty Tools |  |  | Regular |  |  |  |  | 87 |
| Nitrogen Oven | Lithography |  |  | Regular |  |  |  |  | 86 |
| MLA 150 | Lithography |  |  | Regular |  |  |  |  | 85 |
| DUV Resist Stabilizer | Lithography |  |  | Regular |  |  |  |  | 84 |
| Nano Enclosure | Specialty Tools |  |  | Regular |  |  |  |  | 83 |
| Hall Effect Measurement | Metrology |  |  | Regular |  |  |  |  | 82 |
| SSEC RCA | Wet Chemistry |  |  | Regular |  |  |  |  | 81 |
| SSEC Piranha 2 | Wet Chemistry |  |  | Regular |  |  |  |  | 80 |
| SSEC Piranha 1 | Wet Chemistry |  |  | Regular |  |  |  |  | 79 |
| AnnealSys RTA | Furnaces |  |  | Regular |  |  |  |  | 78 |
| PDMS Curing Oven 2 | Soft Lithography |  |  | Regular |  |  |  |  | 77 |
| Silanization Oven | Soft Lithography |  |  | Regular |  |  |  |  | 76 |
| Microfluidic Test Station | Soft Lithography |  |  | Regular |  |  |  |  | 75 |
| PDMS Puncher | Soft Lithography |  |  | Regular |  |  |  |  | 74 |
| PDMS Curing Oven 1 | Soft Lithography |  |  | Regular |  |  |  |  | 73 |
| PDMS Plasma Bonder | Soft Lithography |  |  | Regular |  |  |  |  | 72 |
| PDMS Mixer | Soft Lithography |  |  | Regular |  |  |  |  | 71 |
| PDMS Spin Coater | Soft Lithography |  |  | Regular |  |  |  |  | 70 |
| Leica EM GP | Imaging and Analysis |  |  | Regular |  |  |  |  | 69 |
| Dektak XT 2 | Metrology |  |  | Regular |  |  |  |  | 68 |
| Four Dimensions 4pt Probe | Metrology |  |  | Regular |  |  |  |  | 67 |
| Downstream Asher | Dry Etch |  |  | Regular |  |  |  |  | 66 |
| Suss Resist Developer | Lithography |  |  | Regular |  |  |  |  | 65 |
| Suss Resist Coater | Lithography |  |  | Regular |  |  |  |  | 64 |
| Jandel 4pt Probe | Metrology |  |  | Regular |  |  |  |  | 62 |
| NanoSpec | Metrology |  |  | Regular |  |  |  |  | 61 |
| Filmetrics F40-UV | Metrology |  |  | Regular |  |  |  |  | 60 |
| JEOL E-beam Cleanroom | Lithography |  |  | Regular |  |  |  |  | 59 |
| SPTS Deep Si Etch | Dry Etch |  |  | Regular |  |  |  |  | 58 |
| NanoMill | Imaging and Analysis |  |  | Regular |  |  |  |  | 57 |
| Wyatt DLS | Metrology |  |  | Regular |  |  |  |  | 56 |
| SPTS HF Vapor Etcher | Wet Chemistry |  |  | Regular |  |  |  |  | 55 |
| B101 Spin Rinse Dryer | Wet Chemistry |  |  | Regular |  |  |  |  | 54 |
| Bruker AFM | Imaging and Analysis |  |  | Regular |  |  |  |  | 53 |
| Flip Chip Bonder | Packaging |  |  | Regular |  |  |  |  | 52 |
| Aluminum Wire Bonder | Packaging |  |  | Regular |  |  |  |  | 51 |
| Asylum AFM | Imaging and Analysis |  |  | Regular |  |  |  |  | 50 |
| XRD | Metrology |  |  | Regular |  |  |  |  | 49 |
| B102 Spin Rinse Dryer | Wet Chemistry |  |  | Regular |  |  |  |  | 48 |
| Parametric Test | Metrology |  |  | Regular |  |  |  |  | 47 |
| Metal Liftoff | Wet Chemistry |  |  | Regular |  |  |  |  | 46 |
| ASML Design Station | Lithography |  |  | Regular |  |  |  |  | 45 |
| A103 Photomask Bench | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 44 |
| B102 Acid Hood | Wet Chemistry |  |  | Regular |  |  |  |  | 43 |
| B101 Solvent Hood | Wet Chemistry |  |  | Regular |  |  |  |  | 42 |
| B101 KOH Bench | Wet Chemistry |  |  | Regular |  |  |  |  | 41 |
| B101 Hot Phos Bench | Wet Chemistry |  |  | Regular |  |  |  |  | 40 |
| B101 RCA Bench | Wet Chemistry |  |  | Regular |  |  |  |  | 39 |