| PECVD | Chemical Vapor Deposition |  |  | Regular |  |  |  |  | 2 |
| Sinter | Gen Furnaces |  |  | Regular |  |  |  |  | 1 |
| Dicing saw | Packaging |  |  | Regular |  |  |  |  | 3 |
| Atomic Layer Deposition | Chemical Vapor Deposition |  |  | Regular |  |  |  |  | 4 |
| 790 RIE Middle | Dry Etch |  |  | Regular |  |  |  |  | 129 |
| 790 RIE Nitride Left | Dry Etch |  |  | Regular |  |  |  |  | 131 |
| Downstream Asher | Dry Etch |  |  | Regular |  |  |  |  | 66 |
| Ion Mill | Dry Etch |  |  | Regular |  |  |  |  | 8 |
| Microwave Asher | Dry Etch |  |  | Regular |  |  |  |  | 7 |
| Oxford III-V Etcher | Dry Etch |  |  | Regular |  |  |  |  | 136 |
| Oxford Metal Etcher | Dry Etch |  |  | Regular |  |  |  |  | 134 |
| Oxford Silicon Etcher | Dry Etch |  |  | Regular |  |  |  |  | 135 |
| SPTS Deep Si Etch | Dry Etch |  |  | Regular |  |  |  |  | 58 |
| Unaxis Deep Si Etcher | Dry Etch |  |  | Regular |  |  |  |  | 5 |
| Unaxis ICP Etcher | Dry Etch |  |  | Regular |  |  |  |  | 9 |
| XeF2 Silicon Etcher | Dry Etch |  |  | Regular |  |  |  |  | 6 |
| FEI FIB 1 | Focused Ion Beams |  |  | Regular |  |  |  |  | 13 |
| FEI FIB 2 | Focused Ion Beams |  |  | Regular |  |  |  |  | 14 |
| AnnealSys RTA | Furnaces |  |  | Regular |  |  |  |  | 78 |
| B102 Furnace RCA Clean | Furnaces |  |  | Regular |  |  |  |  | 114 |
| LHL Tube 1 Oxide | Furnaces |  |  | Regular |  |  |  |  | 94 |
| LHL Tube 2 Anneal | Furnaces |  |  | Regular |  |  |  |  | 95 |
| LHL Tube 3 Nitride | Furnaces |  |  | Regular |  |  |  |  | 96 |
| LHL Tube 4 LTO | Furnaces |  |  | Regular |  |  |  |  | 100 |
| RHL Tube 1 Oxide | Furnaces |  |  | Regular |  |  |  |  | 90 |
| RHL Tube 2 Anneal | Furnaces |  |  | Regular |  |  |  |  | 91 |
| RHL Tube 3 Nitride | Furnaces |  |  | Regular |  |  |  |  | 92 |
| RHL Tube 4 Poly | Furnaces |  |  | Regular |  |  |  |  | 93 |
| Asylum AFM | Imaging and Analysis |  |  | Regular |  |  |  |  | 50 |
| Bruker AFM | Imaging and Analysis |  |  | Regular |  |  |  |  | 53 |
| Gemini 500 FESEM | Imaging and Analysis |  |  | Regular |  |  |  |  | 137 |
| Glow Discharge | Imaging and Analysis |  |  | Regular |  |  |  |  | 98 |
| Leica EM GP | Imaging and Analysis |  |  | Regular |  |  |  |  | 69 |
| NanoMill | Imaging and Analysis |  |  | Regular |  |  |  |  | 57 |
| TITAN TEM | Imaging and Analysis |  |  | Regular |  |  |  |  | 11 |
| Veeco AFM | Imaging and Analysis |  |  | Regular |  |  |  |  | 12 |
| ZEISS FESEM | Imaging and Analysis |  |  | Regular |  |  |  |  | 10 |
| ASML Design Station | Lithography |  |  | Regular |  |  |  |  | 45 |
| ASML Stepper | Lithography |  |  | Regular |  |  |  |  | 16 |
| DUV Resist Stabilizer | Lithography |  |  | Regular |  |  |  |  | 84 |
| HMDS Prime | Lithography |  |  | Regular |  |  |  |  | 19 |
| Hotplate 1 | Lithography |  |  | Regular |  |  |  |  | 20 |
| Hotplate 2 | Lithography |  |  | Regular |  |  |  |  | 21 |
| JEOL E-beam | Lithography |  |  | Regular |  |  |  |  | 15 |
| JEOL E-beam Cleanroom | Lithography |  |  | Regular |  |  |  |  | 59 |
| Laser Mask Writer | Lithography |  |  | Regular |  |  |  |  | 25 |
| MLA 150 | Lithography |  |  | Regular |  |  |  |  | 85 |
| Nano-imprinter | Lithography |  |  | Regular |  |  |  |  | 26 |
| Nitrogen Oven | Lithography |  |  | Regular |  |  |  |  | 86 |
| Suss Resist Coater | Lithography |  |  | Regular |  |  |  |  | 64 |
| Suss Resist Developer | Lithography |  |  | Regular |  |  |  |  | 65 |
| SussMA6 | Lithography |  |  | Regular |  |  |  |  | 17 |
| SussMA8 | Lithography |  |  | Regular |  |  |  |  | 18 |
| Vac Oven 1 | Lithography |  |  | Regular |  |  |  |  | 22 |
| Vac Oven 2 | Lithography |  |  | Regular |  |  |  |  | 23 |
| Vac Oven 3 | Lithography |  |  | Regular |  |  |  |  | 24 |
| A102 Develop Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 104 |
| A102 Spinner Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 103 |
| A102 Spinner Left | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 101 |
| A102 Spinner Right | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 102 |
| A103 Develop Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 106 |
| A103 Photomask Bench | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 44 |
| A103 Spinner Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 105 |
| A103 Spinner Left | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 107 |
| A103 Spinner Right | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 108 |
| A104 EBL Develop Hood Left | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 112 |
| A104 EBL Develop Hood Right | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 113 |
| A104 EBL Spinner Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 111 |
| A104 EBL Spinner Left | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 109 |
| A104 EBL Spinner Right | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 110 |
| A105 Develop Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 116 |
| A105 Solvent Hood | Lithography/Spin-Develop |  |  | Regular |  |  |  |  | 117 |
| Dektak XT 1 | Metrology |  |  | Regular |  |  |  |  | 31 |
| Dektak XT 2 | Metrology |  |  | Regular |  |  |  |  | 68 |
| Ellipsometer | Metrology |  |  | Regular |  |  |  |  | 30 |
| Film Stress | Metrology |  |  | Regular |  |  |  |  | 28 |
| Filmetrics F40-UV | Metrology |  |  | Regular |  |  |  |  | 60 |
| Filmetrics F50-UV Mapping | Metrology |  |  | Regular |  |  |  |  | 115 |
| Four Dimensions 4pt Probe | Metrology |  |  | Regular |  |  |  |  | 67 |
| Goniometer | Metrology |  |  | Regular |  |  |  |  | 29 |
| Hall Effect Measurement | Metrology |  |  | Regular |  |  |  |  | 82 |
| Jandel 4pt Probe | Metrology |  |  | Regular |  |  |  |  | 62 |
| Mercury Probe | Metrology |  |  | Regular |  |  |  |  | 88 |
| NanoSpec | Metrology |  |  | Regular |  |  |  |  | 61 |
| Parametric Test | Metrology |  |  | Regular |  |  |  |  | 47 |
| Sensofar Optical Profilometer | Metrology |  |  | Regular |  |  |  |  | 97 |
| Wyatt DLS | Metrology |  |  | Regular |  |  |  |  | 56 |
| XRD | Metrology |  |  | Regular |  |  |  |  | 49 |
| A101 Busch & Lomb | Optical Microscopes |  |  | Regular |  |  |  |  | 120 |
| A101 Leica MZ7 | Optical Microscopes |  |  | Regular |  |  |  |  | 119 |
| A102 Nikon MM-800 | Optical Microscopes |  |  | Regular |  |  |  |  | 121 |
| A103 Nikon L200 | Optical Microscopes |  |  | Regular |  |  |  |  | 122 |
| A105 Nikon L200 | Optical Microscopes |  |  | Regular |  |  |  |  | 123 |
| B107 Nikon L200 | Optical Microscopes |  |  | Regular |  |  |  |  | 124 |
| B107 Nikon SMZ1500 | Optical Microscopes |  |  | Regular |  |  |  |  | 125 |
| Aluminum Wire Bonder | Packaging |  |  | Regular |  |  |  |  | 51 |
| Dynatex GSX Scribe and Break | Packaging |  |  | Regular |  |  |  |  | 89 |
| Flip Chip Bonder | Packaging |  |  | Regular |  |  |  |  | 52 |
| Gold Wire Bonder | Packaging |  |  | Regular |  |  |  |  | 27 |
| E-Beam Evaporator | Physical Vapor Deposition |  |  | Regular |  |  |  |  | 133 |